Atomic step patterning on quartz glass via thermal nanoimprinting
Atomic step patterning on quartz glass via thermal nanoimprinting
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DOI：
10.7567/jjap.54.098001
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发表时间：
2015-08
影响因子：
1.5
通讯作者：
Osamu Suga;M. Yoshimoto;Chieko Okuyama;A. Matsuda;H. Hiroshima;Masaharu Takahashi
中科院分区：
文献类型：
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作者：
Osamu Suga;M. Yoshimoto;Chieko Okuyama;A. Matsuda;H. Hiroshima;Masaharu Takahashi
针对玻璃化转变温度（Tg）高于1000°C的石英玻璃，研究了一种使用热纳米压印技术以及0.2纳米高的原子级台阶蓝宝石模具的新型表面平滑方法。在石英玻璃上实现了约0.1纳米高的台阶阵列的原子级图案化。在1.3兆帕和1000°C的条件下进行压印，加载10分钟，并且发现在真空中1000°C下进行180分钟的后退火处理可部分平滑玻璃表面的原子级台阶形态。
A new surface smoothing method using thermal nanoimprinting technology with a 0.2-nm-high atomically stepped sapphire mold has been investigated for quartz glass with a glass transition temperature (Tg) above 1000 °C. Atomic-scale patterning of approximately 0.1-nm-high step arrays has been achieved on the quartz glass. Imprinting was performed at 1.3 MPa and 1000 °C with loading for 10 min, and postannealing at 1000 °C for 180 min in vacuum was found to partially smooth the atomically stepped morphology of the glass surface.