THE APPLICATION OF PHOTOLITHOGRAPHY TO THE FABRICATION OF MICROCIRCUITS
THE APPLICATION OF PHOTOLITHOGRAPHY TO THE FABRICATION OF MICROCIRCUITS
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DOI：
10.1088/0022-3735/19/9/001
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发表时间：
1986-09-01
期刊：
影响因子：
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通讯作者：
GUNDLACH, AM
中科院分区：
文献类型：
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作者：
STEVENSON, JTM;GUNDLACH, AM
综述了光刻技术，并对光刻技术在微电路制造中的作用进行了定义。介绍了光致抗蚀剂材料的物理、化学和光学性质的详细信息。介绍了目前光学图形转移的生产方法，包括接触印刷法、整片扫描投影法和直接步进法。讨论了光学光刻的局限性，并指出了未来的发展趋势。
The techniques of optical lithography are reviewed and their role in the fabrication of microcircuits is defined. Detailed information on the physical, chemical and optical properties of photoresist materials is presented. Current production methods of optical pattern transfer including contact printing, whole wafer scanning projection and direct-step-on-the-wafer are described. The limits of optical lithography are discussed and future trends are indicated.