Probing a gas/liquid acid-base reaction by X-ray photoelectron spectroscopy.
Probing a gas/liquid acid-base reaction by X-ray photoelectron spectroscopy.
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DOI:
10.1002/anie.201304115
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发表时间:
2013-08
影响因子:
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通讯作者:
Inga Niedermaier;N. Taccardi;P. Wasserscheid;F. Maier;H. Steinrück
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文献类型:
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作者:
Inga Niedermaier;N. Taccardi;P. Wasserscheid;F. Maier;H. Steinrück
One of the most fundamental issues in reaction chemistry is the identification of the reaction mechanism, possible intermediates, or by-products and the reaction kinetics. Numerous analytical methods are routinely employed to monitor the progress of reactions and to extract information on the underlying molecular mechanisms. These methods include NMR, UV/Vis, and IR spectroscopy, mass spectrometry, and calorimetric techniques. X-ray photoelectron spectroscopy (XPS) is not traditionally used for reaction monitoring, although it has the potential to complement these techniques and is even superior in certain respects. Unlike many other spectroscopic tools, XPS is quantitative and enables direct, insitu observation of nearly all elements present in a sample, except hydrogen and helium. Changes of the chemical environment are reflected by changes in the corresponding core-level binding energy, the so-called chemical shifts. Furthermore, XPS is sensitive to the sample surface with a typical information depth at the nanometer scale. This is particularly helpful when studying heterogeneous reactions of gas-phase species with reactive surfaces. It is this interface between both reactants which mainly determines the reaction behavior. Thus, the investigation of processes at reactive interfaces is of fundamental importance.Within the last 20 years, many contributions have been made towards the understanding of reactions on catalytically active metal or metal oxide surfaces by using real-time XPS or other surface-sensitive techniques.[1–10] As most of these techniques require ultra-high vacuum (UHV) conditions, their application is restricted to solid surfaces covered with