Risk of basilar membrane perforation by intracochlear electrodes
Risk of basilar membrane perforation by intracochlear electrodes
复制标题
耳蜗内电极导致基底膜穿孔的风险
DOI：
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
K. Burian
中科院分区：
文献类型：
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作者：
M. Zrunek;K. Burian
摘要植入耳壳内电极可能会损害基底膜、血管纹及邻近结构。当电极被放置在人的颞骨标本中时，穿孔被证明与所使用的植入物的类型、插入的深度或润滑剂的使用无关。螺旋电极加固和未能扩大圆形窗框增加了损坏的风险。穿孔总是局限在距圆窗约7-14 mm的距离处，并出现在底部转弯的曲率最大的部位。
SummaryInsertion of intracochlear electrodes may damage the basilar membrane, the stria vascularis and adjacent structures. When electrodes were placed in human temporal bone specimens, perforations were shown to be independent of the type of implant used, the depth of insertion or the use of a lubricating agent. Helical electrode reinforcements and failure to enlarge the round window frame increase the risk of damage. Perforations are invariably localized at a distance of about 7–14 mm from the round window and occur at the site where the curvature of the basal turn is greatest.