Continuous Deposition System of SnO2 Thin Film by the Liquid Phase Deposition (LPD) Method
Continuous Deposition System of SnO2 Thin Film by the Liquid Phase Deposition (LPD) Method
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DOI：
10.2109/jcersj2.115.856
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发表时间：
2007
影响因子：
1.1
通讯作者：
Y. Saito;Yukinari Sekiguchi;M. Mizuhata;S. Deki
中科院分区：
文献类型：
--
作者：
Y. Saito;Yukinari Sekiguchi;M. Mizuhata;S. Deki
以SnF2-HF水溶液为原料，加入H3BO3水溶液，采用液相沉积（LPD）法制备SnO2薄膜。重点研究了连续沉积系统的构建和沉积速率的控制。将含有SnF2-HF的母液间歇加入到由过量H3BO3组成的处理液中。结果表明，沉积速率基本保持恒定，至少24 h，得到了厚度大于600 nm的均匀SnO2薄膜。
SnO2 thin film was prepared from a SnF2-HF aqueous solution with the addition of H3BO3 aqueous solution by the Liquid Phase Deposition (LPD) method. We focused on the construction of the continuous deposition system and the control of the deposition rate. Parent solution containing SnF2-HF was intermittently added to the treatment solution, which consists of the excess amount of H3BO3. As a result, the deposition rate can be maintained almost constant, at least for 24 h, and uniform SnO2 film with the thickness of more than 600 nm was obtained.