Plasma cleaning of multilayer mirrors in EUV lithography from amorphous carbon contaminations
Plasma cleaning of multilayer mirrors in EUV lithography from amorphous carbon contaminations
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DOI：
10.3103/s0027134911020111
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发表时间：
2011-06
影响因子：
0.3
通讯作者：
E. Malykhin;D. Lopaev;A. Rakhimov;T. Rakhimova;O. V. Braginskii;A. Kovalev;A. Vasil’eva;S. Zyryanov
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文献类型：
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作者：
E. Malykhin;D. Lopaev;A. Rakhimov;T. Rakhimova;O. V. Braginskii;A. Kovalev;A. Vasil’eva;S. Zyryanov
