Plasmonic properties of refractory titanium nitride
Plasmonic properties of refractory titanium nitride
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DOI：
10.1103/physrevb.95.115145
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发表时间：
2017-03-27
影响因子：
3.7
通讯作者：
Calzolari, Arrigo
中科院分区：
文献类型：
--
作者：
Catellani, Alessandra;Calzolari, Arrigo
等离子体激元和超材料器件的发展需要研究替代标准贵金属的高性能材料。氮化钛作为一种耐高温的稳定化合物，最近被认为是一种有效的等离子体材料。在这里，通过使用第一性原理的方法，我们调查的TiN体的等离子体色散关系，我们预测的影响，其光电性能的压力。我们的研究结果解释了TiN在可见光范围内的主要特征，并证明了一个普遍的标度律，它与其作为压力的函数的机械和等离子体性质。最后，我们解决的形成和稳定性的表面等离激元在不同的氮化钛介电界面最近的实验提出。等离子体激元和耐火特性的不寻常组合为实现能够在通常贵金属不可持续的条件下工作的等离子体激元设备铺平了道路。
The development of plasmonic and metamaterial devices requires the research of high-performance materials alternative to standard noble metals. Renewed as a refractory stable compound for durable coatings, titanium nitride has recently been proposed as an efficient plasmonicmaterial. Here, by using a first-principles approach, we investigate the plasmon dispersion relations of TiN bulk and we predict the effect of pressure on its optoelectronic properties. Our results explain the main features of TiN in the visible range and prove a universal scaling law which relates its mechanical and plasmonic properties as a function of pressure. Finally, we address the formation and stability of surface-plasmon polaritons at different TiN-dielectric interfaces proposed by recent experiments. The unusual combination of plasmonics and refractory features paves the way for the realization of plasmonic devices able to work at conditions not sustainable by the usual noble metals.