Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials
Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials
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DOI：
10.1039/c1py00264c
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发表时间：
2011-09
影响因子：
4.6
通讯作者：
Y. Hori;Na Pei;Ryota Kumagai;Yuji Sasanuma
中科院分区：
文献类型：
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作者：
Y. Hori;Na Pei;Ryota Kumagai;Yuji Sasanuma
以N，N-二（2-巯基乙基）-4-甲基苯磺酰胺和4-甲基-N，N-二乙烯基苯磺酰胺为原料，通过硫醇-烯光聚合合成了聚（N-对甲苯磺酰乙烯亚胺-alt-乙硫醚）。其重均分子量通过静态光散射测定为2.8 × 104。该交替共聚物具有-SH和-CH= CH 2端基，并且在常见的有机溶剂如氯仿、四氢呋喃、丙酮和二甲亚砜中表现出高溶解度。将N-甲苯磺酰化的共聚物脱保护以产生聚（乙烯亚胺-alt-乙烯硫化物），其完全可溶于二甲基亚砜、乙酸和乙醇中。N-甲苯磺酰化和脱保护的聚合物都是疏水性的，前者和后者的聚合物分别在272和244 °C下热分解。
Poly(N-tosyl-ethylene imine-alt-ethylene sulfide) has been synthesized by thiol-ene photopolymerization between N,N-bis(2-mercaptoethyl)-4-methylbenzenesulfonamide and 4-methyl-N,N-divinylbenzenesulfonamide. Its weight-average molecular weight was determined by static light scattering to be 2.8 × 104. The alternating copolymer has –SH and –CH=CH2 end groups and exhibits high solubility in common organic solvents such as chloroform, tetrahydrofuran, acetone, and dimethyl sulfoxide. The N-tosylated copolymer was deprotected to yield poly(ethylene imine-alt-ethylene sulfide), which is fully soluble in dimethyl sulfoxide, acetic acid, and ethanol. Both N-tosylated and deprotected polymers are hydrophobic, and the former and latter polymers are thermally decomposed at 272 and 244 °C, respectively.