Fabrication of CdS Thin Film Pattern by CBD Method Using the Self-Assembled Monolayer
Fabrication of CdS Thin Film Pattern by CBD Method Using the Self-Assembled Monolayer
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使用自组装单分子层通过 CBD 方法制造 CdS 薄膜图案
DOI：
10.4028/www.scientific.net/msf.449-452.449
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
W. Jung
中科院分区：
文献类型：
--
作者：
S. Jung;D. Jeong;J. Kim;W. Jung
采用微接触印刷技术在不同基底上制备了疏水性的十八烷基三氯硅烷（OTS）材料，并采用化学浴沉积法（CBD）制备了精细图案化的CdS薄膜。在初步实验中，证实了CdS薄膜的胶体颗粒尺寸和表面粗糙度随pH值、制备时间和温度的增加而增加。利用微接触印刷的SAM选择性沉积CdS膜图案的最佳条件确定为pH 10，温度75°C，沉积时间15分钟。在本工作确定的条件下，成功地在大面积上制备出了各种形状的CdS薄膜图形。通过EDS和XPS证实了CdS的化学计量比为1：1。
Microcontact printing of hydrophobic OTS (Octadecyl-Trichloro-Silane) material was made on various substrates, and finely patterned CdS thin film has been fabricated by CBD (Chemical Bath Deposition) method. In the preliminary experiment, it is confirmed that the size of colloid particle and roughness of surface of CdS thin film are increased with increase of pH, fabrication time and temperature. The optimum condition for the selective deposition of CdS film pattern using the SAM with microcontact printing was determined to be pH 10, temperature of 75°C, deposition time of 15 minute. Various patterns of different shape of CdS thin film were fabricated uniformly and satisfactorily in large area by the conditions determined in the present work. The stoichiometric composition of CdS was confirmed to be 1:1 by EDS and XPS.