Plasma Electrochemistry in Radio Frequency Discharges Oxidation of Silver in a Chlorine Plasma
Plasma Electrochemistry in Radio Frequency Discharges Oxidation of Silver in a Chlorine Plasma
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射频放电中的等离子体电化学氯等离子体中银的氧化
DOI：
10.1149/1.1608004
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发表时间：
2003
影响因子：
3.9
通讯作者：
J. Janek
中科院分区：
文献类型：
--
作者：
M. Vennekamp;J. Janek
银电极氧化的等离子体阳极实验是在 50 至 180°C 温度范围内的电感耦合氯等离子体中进行的。使用气压约为 1 mbar 的纯氯等离子体。与热条件相比，氯化银薄膜在等离子体中的生长速率大大提高，并且可以通过在恒电流和恒电位条件下施加外部电势来有效控制。对卤化银薄膜生长动力学的分析表明，生长速率受到热实验中穿过产物薄膜和等离子体阳极实验中穿过等离子体的电子通量的限制。实验表明，产物层的厚度与通过等离子体电化学电池Ag/AgCl/等离子体/碳的电荷成正比。产物层上的电流密度约为1mA/cm 2 。生长速率的增强小于法拉第定律的预测，表明存在电子泄漏电流或阳极溅射。
Plasma-anodic experiments on the oxidation of silver electrodes were performed in an inductively coupled chlorine plasma in the temperature range between 50 and 180°C. Pure chlorine plasmas with gas pressures on the order of 1 mbar were employed. The growth rate of the silver chloride films was strongly enhanced in the plasma compared to thermal conditions, and it could be controlled effectively by applying an external electric potential under both galvanostatic and potentiostatic conditions. An analysis of the growth kinetics of the silver halide film shows that the growth rate is limited by the electron flux across the product film in the thermal experiment and across the plasma in the plasma-anodic experiment. It is experimentally shown that the thickness of the product layer is proportional to the electrical charge passed through the plasma-electrochemical cell Ag/AgCl/plasma/carbon. Current densities across the product layer were in the order of 1 mA/cm 2 . The enhancement of the growth rate is smaller than predicted by Faraday's law, indicating either electronic leakage currents or anode sputtering.