Structure and magnetic properties of sputtered FePtM (M = Ti, Nb) thin films
Structure and magnetic properties of sputtered FePtM (M = Ti, Nb) thin films
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溅射 FePtM (M = Ti, Nb) 薄膜的结构和磁性能
DOI：
10.1016/j.matlet.2007.01.030
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发表时间：
2007
影响因子：
3
通讯作者：
Sea
中科院分区：
文献类型：
--
作者：
T. Mahalingam;J. Chu;Sea
采用射频熔融法制备了掺钛、掺Nb浓度在2.9~9.1at.%范围内的FePT薄膜。磁控溅射。研究了掺钛和掺Nb的FePT薄膜的结构和磁性能。结构研究表明，FePT薄膜的长程有序化取决于FePT薄膜的掺杂浓度和热处理温度。发现钛和Nb的加入促进了FePT薄膜的细化。研究和讨论了掺杂浓度对FePT薄膜磁性能的影响。
FePt thin films doped with various Ti and Nb concentrations ranging from 2.9 to 9.1 at.% were prepared by r.f. magnetron sputtering. The structural and magnetic properties of Ti- and Nb-doped FePt thin films were investigated. Structural studies revealed that the long range ordering in FePt thin films depends on the doping concentration and annealing temperature of FePt thin films. The addition of Ti and Nb is found to enhance the grain refining in FePt thin films. The effects of doping concentration on the magnetic properties of FePt thin films were studied and discussed.