Dual-floor burr hole adjusted to burr-hole ring and cap for implantation of stimulation electrodes. Technical note.
Dual-floor burr hole adjusted to burr-hole ring and cap for implantation of stimulation electrodes. Technical note.
复制标题
双层钻孔调整为钻孔环和帽，用于植入刺激电极。
DOI：
10.3171/jns.2003.99.4.0783
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发表时间：
2003
影响因子：
4.1
通讯作者：
C. Fukaya
中科院分区：
文献类型：
--
作者：
Takamitsu Yamamoto;Y. Katayama;Kazutaka Kobayashi;H. Oshima;C. Fukaya
使用一种新的穿孔器，作者开发了一种新的双层钻孔方法，用于深部脑刺激治疗。这种改进被称为“双层”，因为通常直径为15mm的钻孔位于中心并到达硬脑膜，周围环绕着一个4mm宽的边缘，该边缘也被新的穿孔器向下平面至4mm深。这种双层毛刺孔调整，以适应毛刺孔环和帽，是由电极制造商提供。这种方法消除了在钻孔环和帽上方的头皮肿胀。此外，它有助于确保钻孔环和颅骨之间的紧密固定。
Using a new perforator, the authors have developed a new dual-floor burr-hole method for use in deep brain stimulation therapy. The modification is called "dual-floor" because the usual 15-mm-diameter burr hole, which is located centrally and reaches the dura mater, is surrounded by a 4-mm-wide rim that is also planed downward by the new perforator to a depth of 4 mm. This dual-floor burr hole is adjusted to fit the burr-hole ring and cap that are are supplied by the electrode manufacturer. Such a method eliminates bulging of the scalp just over the burr-hole ring and cap. In addition, it is helpful for securing a tight fixation between the burr-hole ring and the skull.