Tetrabutylammonium bromide assisted preparation of monodispersed submicrometer silica particles

Tetrabutylammonium bromide assisted preparation of monodispersed submicrometer silica particles
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四丁基溴化铵辅助制备单分散亚微米二氧化硅颗粒

DOI:
10.1016/j.colsurfa.2021.126171
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发表时间:
2021-01-28
影响因子:
5.2
通讯作者:
Yang, Wensheng
Yang, Wensheng
中科院分区:
化学2区
文献类型:
--
作者:
Dong, He;Han, Yandong;Yang, Wensheng

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In this work, we demonstrate a new, facile approach for preparation of monodispersed, submicrometer silica particles via a tetrabutylammonium bromide (TBABr) assisted Sto center dot ber method. Sizes of the resulting silica particles increased from 0.39 to 1.08 mu m with polydispersity lower than 5 % while the concentration of TBABr in the reaction media was elevated from 0 to 20.0 mM. The presence of TBABr molecules was able to effectively suppress the condensation rate of silanol monomers during the Sto center dot ber reaction, which, in turn, slowed the formation of silica seeds and thus accounted for growth of large silica particles. The use of tetraethylammonium bromide (TOABr), a quaternary ammonium agent with longer alkyl chains, instead of TBABr, yielded mono disperse silica particles more hydrophobic in character, making it feasible to tailor the surface properties of the as-prepared silica particles.