Photoelectroplating light modulator.

Photoelectroplating light modulator.
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光电电镀光调制器。

DOI:
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发表时间:
1968
期刊:
影响因子:
1.9
通讯作者:
D. E. Brown
D. E. Brown
中科院分区:
工程技术4区
文献类型:
--
作者:
A. E. Attard;D. E. Brown

文献摘要

被引文献

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基于光电导半导体上光子控制电镀金属的原理,研制了一种二维光调制器。它可以用于透射或反射,并形成正或负图像。一些观察到的调制器的特性是:18线对/毫米的分辨率,可重复使用的程度约10个周期,和图像形成时间为0.5-5秒。其他实验观察进行了描述,并在半导体参数的器件性能进行了分析。
A two-dimensional light modulator has been developed based on the principle of photon controlled electroplating of metal onto a photoconducting semiconductor. It may be used in transmission or reflection, and forms positive or negative images. Some observed characteristics of the modulator are: 18-line pairs/mm resolution, reusability to the extent of about ten cycles, and image formation time of 0.5-5 sec. Other experimental observations are described, and device performance is analyzed in terms of semiconductor parameters.