Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation
Influence of annular magnet on discharge characteristics in enhanced glow discharge plasma immersion ion implantation
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DOI：
10.1063/1.3537962
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发表时间：
2011-01
影响因子：
4
通讯作者：
Liuhe Li;Zhuo Wang;Q. Lu;En Jing Pang;D. Dun;F. He;Fen Li;R. Fu;P. Chu
中科院分区：
文献类型：
--
作者：
Liuhe Li;Zhuo Wang;Q. Lu;En Jing Pang;D. Dun;F. He;Fen Li;R. Fu;P. Chu
在增强辉光放电等离子体浸没离子注入（EGD-PIII）中，在接地阳极处放置永环形磁体改变放电特性。由于磁镜像效应，非均匀磁场增加了电子路径长度，限制了电子运动，从而更频繁地发生电子中性碰撞。用朗缪尔探针测量的等离子体电位和离子密度证实，在接地阳极附近电离得到了改善。这种混合磁场EGD-PIII方法适用于低电离率气体的注入。
A permanent annular magnet positioned at the grounded anode alters the discharge characteristics in enhanced glow discharge plasma immersion ion implantation (EGD-PIII). The nonuniform magnetic field increases the electron path length and confines electron motion due to the magnetic mirror effect and electron-neutral collisions thus occur more frequently. The plasma potential and ion density measured by a Langmuir probe corroborate that ionization is improved near the grounded anode. This hybrid magnetic field EGD-PIII method is suitable for implantation of gases with low ionization rates.