Ion heating in the PISCES-RF liquid-cooled high-power, steady-state, helicon plasma device

Ion heating in the PISCES-RF liquid-cooled high-power, steady-state, helicon plasma device
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PISCES-RF 液冷高功率稳态螺旋等离子体装置中的离子加热

DOI:
10.1088/1361-6595/abff10
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发表时间:
2021
影响因子:
3.8
通讯作者:
Tynan, G R
Tynan, G R
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Thakur, S Chakraborty;Paul, M;Hollmann, E M;Lister, E;Scime, E E;Sadhu, S;Steinberger, T E;Tynan, G R

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射频(RF)驱动的螺旋等离子体源通常用于它们以相对中等的功率(典型的RF功率<2kW)产生高密度氩等离子体(n> 10 19 m-3)的能力。典型的电子温度< 10 eV,典型的离子温度< 0.6 eV。一个新设计的螺旋天线组件(同心,双层,完全液体冷却的RF透明窗口)在稳定状态下运行的RF功率高达10千瓦。我们报告的氩等离子体密度,电子温度和离子温度对射频功率的依赖性。在10 kW时,用激光诱导荧光法测量了氩等离子体中离子温度> 2 eV,这与简单的体均0维功率平衡模型一致。这些等离子体条件下的中性密度分布的一维蒙特卡罗模拟显示,在核心附近有很强的中性耗尽,并预测中性温度远高于室温。在这种高功率螺旋源中产生的等离子体(当采用轻离子时)非常适合于聚变偏滤器等离子体-材料相互作用研究和中性束的负离子产生。
Radio frequency (RF) driven helicon plasma sources are commonly used for their ability to produce high-density argon plasmas (n> 10 19 m− 3) at relatively moderate powers (typical RF power< 2 kW). Typical electron temperatures are< 10 eV and typical ion temperatures are< 0.6 eV. A newly designed helicon antenna assembly (with concentric, double-layered, fully liquid-cooled RF-transparent windows) operates in steady-state at RF powers up to 10 kW. We report on the dependence of argon plasma density, electron temperature and ion temperature on RF power. At 10 kW, ion temperatures> 2 eV in argon plasmas are measured with laser induced fluorescence, which is consistent with a simple volume averaged 0D power balance model. 1D Monte Carlo simulations of the neutral density profile for these plasma conditions show strong neutral depletion near the core and predict neutral temperatures well above room temperatures. The plasmas created in this high-power helicon source (when light ions are employed) are ideally suited for fusion divertor plasma-material interaction studies and negative ion production for neutral beams.
氩螺旋源中中性和离子激发态密度的参数缩放
DOI: 10.1088/0963-0252/25/2/025001
发表时间: 2016
影响因子: 3.8
作者:
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影响因子: 4
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发表时间: 2018
期刊: Physics of Plasmas
影响因子: 2.2
作者:
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通讯作者: J. Rapp
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DOI: 10.1063/1.3466796
发表时间: 2010
期刊: The Review of scientific instruments
影响因子: --
作者:
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DOI: 10.1109/tps.2016.2628326
发表时间: 2016
影响因子: 1.5
作者:
J. Rapp;T. Biewer;T. Bigelow;J. Caughman;R. Duckworth;R. J. Ellis;D. Giuliano;R. Goulding;D. Hillis;R. Howard;T. Lessard;J. Lore;A. Lumsdaine;E. Martin;W. D. Mcginnis;S. Meitner;L. Owen;H. Ray;G. Shaw;V. Varma
通讯作者: V. Varma