Investigation of ionized cluster beam bombardment and its applications for materials modification
Investigation of ionized cluster beam bombardment and its applications for materials modification
复制标题
电离簇束轰击及其在材料改性中的应用研究
DOI：
10.1080/10420159208219829
复制
发表时间：
1992
影响因子：
1
通讯作者：
I. Yamada
中科院分区：
文献类型：
--
作者：
I. Yamada
摘要研究了离子团束（ICB）轰击对成膜过程的影响，以了解用这种方法生长的薄膜的独特性质。通过结合团簇大小分布测量的结果。通过对离子束沉积初期的STM成像、生长膜的特性、离子束沉积的主要特征等的分析，阐明了离子束沉积与分子束外延的区别。利用新研制的气体团簇束流系统，获得了表面轰击效应的初步结果。
Abstract Effects of ionized cluster beam (ICB) bombardment on film formation process have been studied in order to understand the unique properties of films grown by this method. By combining the results from cluster size distribution measurements. STM imaging of the initial stages of deposition, and the grown film characteristics, the principal features of ICB is elucidated and the differences between ICB deposition and MBE are clarified. By using a newly developed gas cluster beam system, preliminary results of surface bombarding effect have been obtained.