Beryllium coatings on metals for marker tiles at JET: development of process and characterization of layers
Beryllium coatings on metals for marker tiles at JET: development of process and characterization of layers
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JET 标记瓷砖金属上的铍涂层：工艺开发和层表征
DOI：
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发表时间：
2007
期刊：
影响因子：
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通讯作者：
G. Matthews
中科院分区：
文献类型：
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作者：
C. Lungu;I. Mustaţă;V. Zaroschi;A. M. Lungu;A. Anghel;P. Chiru;M. Rubel;P. Coad;G. Matthews
全金属壁JET托卡马克运行的预备研究（类ITER壁项目）也包括旨在开发薄铍涂层的若干活动。目的有两个：（i）涂覆内壁覆层的Inconel®瓷砖;（ii）开发用于生产所谓标记瓷砖的薄膜的方法，以便能够监测限制器的Be侵蚀。标记膜的性能必须尽可能与散装Be的性能匹配。研发过程的第一步是评估涂层方法和沉积在试样上的涂层质量。以5±0.5 nm s-1的平均沉积速率沉积了高纯度、与基底具有良好粘附性的光滑、致密的Be膜，厚度为7.5 μm。研制了一种标记结构，它是在块体Be上淀积一层厚度为2.5 μm的Ni中间层，然后在7.5 μm的Be膜上淀积一层。概述了标记涂层的制造工艺和性能。
Preparatory study for the operation of the JET tokamak with a full metal wall (ITER-like wall project) also comprises several activities aiming at the development of thin beryllium coatings. The purpose is 2-fold: (i) to coat Inconel® tiles of the inner wall cladding; (ii) to develop methods for production of films for so-called marker tiles in order to enable monitoring of Be erosion from limiters. Properties of the marker film must match, as closely as possible, those of bulk Be. The first step in the R&D process was to assess coating methods and the quality of layers deposited on test coupons. Smooth, dense Be films of high purity and good adhesion to the substrate were deposited with an average deposition rate of 5±0.5 nm s−1 to a thickness of 7.5 μm. A marker structure consisting of a 7.5 μm Be film on top of a 2.5 μm Ni interlayer deposited on a bulk Be block has been developed and characterized by means of material analysis methods. An overview of manufacturing processes and properties of the marker coatings is presented.