Removal rate and surface roughness in the lapping and polishing of RB-SiC optical components
Removal rate and surface roughness in the lapping and polishing of RB-SiC optical components
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DOI：
10.1016/j.jmatprotec.2007.04.091
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发表时间：
2007-10-01
影响因子：
6.3
通讯作者：
Wang, Y. W.
中科院分区：
文献类型：
--
作者：
Tam, H. Y.;Cheng, H. B.;Wang, Y. W.
反应烧结碳化硅（RB-SiC）材料由于具有低密度、高硬度和低热膨胀系数等独特的性能，引起了研究者和工程师的极大兴趣。本研究的重点是RB-SiC光学元件的高效制造。在这里，提出了一个两阶段的制造过程。首先，用固体颗粒状磨料固定的板用于快速去除表面误差和初始光顺。之后，使用毛毡抛光剂和金刚石磨料进行精细的误差去除和表面抛光。基于Form Talysurf表面轮廓仪测量材料去除率和表面粗糙度。通过在30 ~ 10 μ m范围内连续调整磨料粒度，初始粗糙度Ra = 110.8 nm，研磨5 min后，最终表面粗糙度达到21.6 nm，使用不同粒度的金刚石浆料作为抛光磨料，研磨15 min后，表面粗糙度收敛到10.7 nm。通过实验验证了两阶段工艺在效率和表面质量方面的有效性。这些因素是如何影响的过程参数，如相对转速，磨料粒度等也检查。(c)2007 Elsevier B. V.保留所有权利。
Optical components made of reaction-bonded silicon carbide (RB-SiC) have aroused the interest of researchers and engineers due to their distinct properties, such as low density, high hardness and low thermal expansion coefficient. The present study focuses on efficient fabrication of RB-SiC optical components. Here, a two-stage fabrication process is proposed. Firstly, a plate fixed with solid pellet-shaped abrasives is used for rapid removal of surface error and initial smoothing. After that, fine error removal and surface polishing is performed using felt buffs and diamond abrasives. Material removal rates and surface roughness are measured based on a Form Talysurf surface profiler. The final surface roughness with an initial value of Ra = 110.8 nanometer (nm) reached 21.6 nm after 5 min of lapping by adjusting the size of abrasives continuously from 30 to 10 micrometer (mu m), and then convergent to 10.7 nm after 15 min of polishing using different sized diamond pastes as the polishing abrasive. The validity of the two-stage process in terms of efficiency and surface quality has been verified by experiments. How these factors are affected by process parameters such as the relative rotation speed, abrasives grit size, etc. are also examined. (c) 2007 Elsevier B.V. All rights reserved.