Engineering of microfabricated ion traps and integration of advanced on-chip features
Engineering of microfabricated ion traps and integration of advanced on-chip features
复制标题
DOI：
10.1038/s42254-020-0182-8
复制
发表时间：
2019-08
影响因子：
38.5
通讯作者：
Z. D. Romaszko;Seokjun Hong;M. Siegele;R. Puddy;F. R. Lebrun-Gallagher;S. Weidt;W. Hensinger
中科院分区：
文献类型：
--
作者：
Z. D. Romaszko;Seokjun Hong;M. Siegele;R. Puddy;F. R. Lebrun-Gallagher;S. Weidt;W. Hensinger
长期以来，被困在电磁势中的原子离子一直被用于量子物理学的基础研究。在过去的二十年里，捕获离子已成功地用于实现量子计算，量子模拟，原子钟，质谱仪和量子传感器等技术。先进的制造技术，从其他建立或新兴学科，用于创建新的，可靠的离子阱设备，旨在大规模集成和兼容性与商业制造。在讨论上述应用的离子阱设计之前，本技术评论涵盖了离子阱的基本原理。我们概述了当前的微细加工技术和材料和工艺选择背后的各种考虑。最后，我们讨论了目前的努力，包括先进的，在下一代离子阱片上功能。
Atomic ions trapped in electromagnetic potentials have long been used for fundamental studies in quantum physics. Over the past two decades, trapped ions have been successfully used to implement technologies such as quantum computing, quantum simulation, atomic clocks, mass spectrometers and quantum sensors. Advanced fabrication techniques, taken from other established or emerging disciplines, are used to create new, reliable ion-trap devices aimed at large-scale integration and compatibility with commercial fabrication. This Technical Review covers the fundamentals of ion trapping before discussing the design of ion traps for the aforementioned applications. We overview the current microfabrication techniques and the various considerations behind the choice of materials and processes. Finally, we discuss current efforts to include advanced, on-chip features in next-generation ion traps.