Atmospheric pressure plasma functionalization of polystyrene
Atmospheric pressure plasma functionalization of polystyrene
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DOI：
10.1116/6.0001850
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发表时间：
2022-07-01
影响因子：
2.9
通讯作者：
Kushner, Mark J.
中科院分区：
文献类型：
--
作者：
Polito, Jordyn;Denning, Mark;Kushner, Mark J.
大气压等离子体射流（APPJ）用于改善商品烃聚合物如聚丙烯、聚乙烯和聚苯乙烯（PS）的粘合和亲水性质。这些改进很大程度上是由于向表面添加了氧官能团。PS功能化对于生产高价值的生物相容性孔板和皿是有意义的，其需要对表面性质进行精确控制。在本文中，我们讨论的结果从计算调查的APPJ功能化PS表面使用He/O-2/H2O气体混合物。讨论了暴露于这些等离子体后PS功能化的新表面反应机制。一个全球性的等离子体模型操作活塞流模式被用来预测等离子体产生的物种通量到PS表面上。使用表面位点平衡模型来预测暴露于等离子体和环境空气之后的PS的氧官能化。我们发现，表面上的O-占有率与PS的O-原子通量密切相关，醇基和交联产物对总氧分数的贡献最大。在等离子体后暴露于空气中时，自由基位点（如烷氧基和过氧基）通过钝化和交联而迅速消耗。接近10（17）cm（-2）的O-原子注量使PS表面上的O-占据饱和，产生对操作条件的适度变化不特别敏感的功能性。nbsp;在AVS的独家许可下发布。
Atmospheric pressure plasma jets (APPJs) are used to improve the adhesive and hydrophilic properties of commodity hydrocarbon polymers such as polypropylene, polyethylene, and polystyrene (PS). These improvements largely result from adding oxygen functional groups to the surface. PS functionalization is of interest to produce high value biocompatible well-plates and dishes, which require precise control over surface properties. In this paper, we discuss results from a computational investigation of APPJ functionalization of PS surfaces using He/O-2/H2O gas mixtures. A newly developed surface reaction mechanism for functionalization of PS upon exposure to these plasmas is discussed. A global plasma model operated in plug-flow mode was used to predict plasma-produced species fluxes onto the PS surface. A surface site balance model was used to predict oxygen-functionalization of the PS following exposure to the plasma and ambient air. We found that O-occupancy on the surface strongly correlates with the O-atom flux to the PS, with alcohol groups and cross-linked products making the largest contributors to total oxygen fraction. Free radical sites, such as alkoxy and peroxy, are quickly consumed in the post-plasma exposure to air through passivation and cross-linking. O-atom fluences approaching 10(17) cm(-2) saturate the O-occupancy on the PS surface, creating functionality that is not particularly sensitive to moderate changes in operating conditions.& nbsp;Published under an exclusive license by the AVS.