Development of very large helicon plasma source
Development of very large helicon plasma source
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DOI：
10.1063/1.1753089
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发表时间：
2004-05
影响因子：
1.6
通讯作者：
S. Shinohara;T. Tanikawa
中科院分区：
文献类型：
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作者：
S. Shinohara;T. Tanikawa
我们研制了一台直径75 cm、轴长486 cm的超大体积、高密度螺旋等离子体源，等离子体密度的半高宽可达1.42 cm，沿z轴沿着均匀。通过使用位于真空室端部外部的螺旋天线，通过石英玻璃窗，可以用非常低的射频（rf）功率（<1 W）引发等离子体，并在不到几百瓦的情况下成功产生超过1012 cm − 3的电子密度，实现出色的放电效率。可以通过改变天线附近的磁场配置和/或天线辐射场模式来控制该设备中的径向密度分布。
We have developed a very large volume, high-density helicon plasma source, 75 cm in diameter and 486 cm in axial length; full width at half maximum of the plasma density is up to ∼42 cm with good plasma uniformity along the z axis. By the use of a spiral antenna located just outside the end of the vacuum chamber through a quartz-glass window, plasma can be initiated with a very low value of radio frequency (rf) power (<1 W), and an electron density of more than 1012 cm−3 is successfully produced with less than several hundred Watt; achieving excellent discharge efficiency. It is possible to control the radial density profile in this device by changing the magnetic field configurations near the antenna and/or the antenna radiation-field patterns.