Magnetic and crystallographic properties of Co‐Cr‐(Ta,Pt)/Cr films deposited by excimer laser ablation
Magnetic and crystallographic properties of Co‐Cr‐(Ta,Pt)/Cr films deposited by excimer laser ablation
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DOI：
10.1063/1.355531
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发表时间：
1994-05
影响因子：
3.2
通讯作者：
A. Ishikawa;K. Tanahashi;Y. Yahisa;Y. Hosoe;Y. Shiroishi
中科院分区：
文献类型：
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作者：
A. Ishikawa;K. Tanahashi;Y. Yahisa;Y. Hosoe;Y. Shiroishi
研究了KrF准分子激光烧蚀沉积Co合金薄膜的晶体结构和磁性。将波长为248 nm的脉冲激光聚焦到固定在真空室中的沉积靶上。以0.012 nm/脉冲的速率连续沉积了铬底层和钴合金薄膜。与溅射的薄膜相比，薄膜表面在微观上是光滑的。这可能是由于激光沉积过程中阴影效应较小所致。尽管薄膜的成分与靶材的成分略有不同，但薄膜的成分是可重复控制的。在250°C下，在Si和Ni-P衬底上形成的Co-Cr-Pt/Cr薄膜的矫顽力分别为130和220 Oe，约为溅射薄膜的矫顽力的五分之一。结晶学分析表明，铬底层无晶向取向，钴合金膜由细小的面心立方晶体组成。激光沉积的薄膜具有较低的矫直力，这可能是由于薄膜中缺乏铁氧体的缘故。
The crystal structure and magnetic properties of Co‐alloy films deposited by KrF excimer laser ablation were investigated. A pulsed laser beam with wavelength of 248 nm was focused onto the deposition targets which were fixed in the vacuum chamber. Cr underlayer and Co‐alloy films were successively deposited at a rate of 0.012 nm/pulse. The film surface was microscopically smooth compared to the sputtered films. This may be due to the low shadowing effect during the laser deposition. The composition of the film was reproducibly controlled, though there was a slight difference between the composition of film and target material. The coercivities of Co‐Cr‐Pt/Cr films formed on the Si and Ni‐P substrates at 250 °C were 130 and 220 Oe, which were about one‐fifth of the coercivity of sputtered films. Crystallographic analyses showed that Cr underlayer had no crystal orientation, and Co‐alloy film consisted of fine fcc‐type crystal grains. Low coercivity of the laser‐deposited film is probably due to the lack o...