Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes
Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes
复制标题
DOI：
10.3788/col201715.100501
复制
发表时间：
2017-07
影响因子：
3.5
通讯作者：
Donghan Ma;Lijiang Zeng
中科院分区：
文献类型：
--
作者：
Donghan Ma;Lijiang Zeng
这项研究提出了一种简单实用的方法来制造低杂散光光栅，其中基板在平行或垂直于曝光干涉条纹的方向上移动约1毫米的距离。当基板移动时，使用基板旁边的参考光栅来实时调整曝光干涉条纹相对于基板的相位。平移消除了曝光缺陷，从而减少了光栅的杂散光。采用这种方法成功制作了多种光栅，与传统干涉光刻制作的光栅相比，这些光栅具有更直的凹槽、更光滑的表面和更低的杂散光。
This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves, smoother surfaces, and lower stray light than gratings made in conventional interference lithography.