Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
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DOI：
10.1080/21663831.2016.1233914
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发表时间：
2017-01-01
影响因子：
8.3
通讯作者：
Schneider, Jochen M.
中科院分区：
文献类型：
--
作者：
Baben, Moritz to;Hans, Marcus;Schneider, Jochen M.
物理气相沉积（PVD）过程中的极端冷却速率允许亚稳相的生长。然而，我们建议，反应PVD工艺可以描述由气固准平衡定义的化学成分，从而点缺陷浓度。我们认为这种概念可以通过控制沉积条件来实现点缺陷工程.例如，我们证明，通过最大限度地减少空位浓度，亚稳态（Ti，Al）Nx（磨损保护工业基准涂层）的热稳定性可以从800摄氏度提高到前所未有的1200摄氏度。这里制定的热力学方法为通过反应沉积薄膜中的点缺陷进行热稳定性工程开辟了一条途径。
Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas-solid paraequilibrium defining chemical composition and thus point defect concentration. Weshow that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti, Al) Nx, the industrial benchmark coating for wear protection, can be increased from 800 degrees C to unprecedented 1200 degrees C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films.