Nuclear magnetic resonance study of thin Co 2 FeAl 0.5 Si 0.5 Heusler films with varying thickness
Nuclear magnetic resonance study of thin Co 2 FeAl 0.5 Si 0.5 Heusler films with varying thickness
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DOI：
10.1103/physrevb.91.064421
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发表时间：
2013-11
影响因子：
3.7
通讯作者：
A. Alfonsov;B. Peters;F. Y. Yang;B. Buchner;S. Wurmehl
中科院分区：
文献类型：
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作者：
A. Alfonsov;B. Peters;F. Y. Yang;B. Buchner;S. Wurmehl
结构有序的类型和程度是理解和控制高自旋极化赫斯勒化合物性质的一个重要方面。在这项工作中，我们将核磁共振（NMR）揭示的结构有序和局部磁性能与不同厚度的 Co2FeAl0.5Si0.5 Heusler 薄膜的物理性能进行了比较。我们发现 L21 型有序度非常高，高达 81%，同时以 Al 和 Si 为代价，Fe 过量 8% 至 13%。我们的 NMR 研究证明了非常好的质量，这表明用于生长薄膜的离轴溅射技术的新技术为自旋电子器件中 Co2FeAl0.5Si0.5 的优化性能奠定了基础。
Type and degree of structural order is an important aspect for understanding and controlling the properties of highly spin polarized Heusler compounds. In this work, we compare the structural order and the local magnetic properties revealed by nuclear magnetic resonance (NMR) with the physical properties of thin Co2FeAl0.5Si0.5 Heusler films with varying thickness. We find a very high degree of L21 type ordering up to 81% concomitantly with excess Fe of 8 to 13% in the expense of Al and Si. The very good quality as demonstrated by our NMR study suggest that the novel technique of off-axis sputtering technique used to grow the films sets stage for the optimized performance of Co2FeAl0.5Si0.5 in spintronic devices.