Spectroscopic analysis of a-C and a-CNx films prepared by ultrafast high repetition rate pulsed laser deposition
Spectroscopic analysis of a-C and a-CNx films prepared by ultrafast high repetition rate pulsed laser deposition
复制标题
DOI:
10.1063/1.1874300
复制
发表时间:
2005-03
影响因子:
3.2
通讯作者:
R. McCann;S. Roy;P. Papakonstantinou;J. McLaughlin;S. Ray
中科院分区:
文献类型:
--
作者:
R. McCann;S. Roy;P. Papakonstantinou;J. McLaughlin;S. Ray
The effect of nitrogen partial pressure on amorphous carbon nitride (a-CNx) (0.0⩽x⩽0.17) and laser fluence on amorphous carbon (a-C) films prepared by ultrafast high repetition rate pulsed laser deposition has been studied. The chemical bonding structure of the films was investigated by x-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and Fourier transform infrared (FTIR) analysis. XPS studies of films revealed an increase in the CN sites at the expense of CC bonded carbon sites as nitrogen content in the films increased. Films (a-C) prepared as a function of laser fluence showed an increase in sp3-bonded carbon as laser fluence was increased from 0.36 to 1.7J∕cm2. The ID∕IG ratio and G peak position increased as a function of nitrogen whereas the full width at half maximum (FWHM) of the G peak decreased. This is indicative of either an increase in the size or number of the sp2 sites. Films prepared as a function of laser fluence revealed a decrease of the ID∕IG ratio and an increase in the FWH...