Thin film resonator technology
Thin film resonator technology
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DOI：
10.1109/freq.2003.1275190
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发表时间：
2005-09
期刊：
影响因子：
--
通讯作者：
K. Lakin
中科院分区：
文献类型：
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作者：
K. Lakin
薄膜谐振器技术已经以各种形式发展了四十多年。虽然基本的方法是来自于达到比通过减薄体晶体容易达到的更高频率的愿望，但总是有竞争的技术或基本材料或加工问题阻碍了发展。最后，无线市场达到了一个临界点，其中竞争技术似乎无法满足现代无线应用的需求，薄膜方法开始得到一些重视。本文将对薄膜谐振器技术进行综述。将尽一切努力对有关应用和竞争技术的技术进行客观分析，并指出已知的进一步向高频技术发展的障碍和希望。
The thin film resonator technology has been under development for over forty years in one form or another. Although the basic approach is derived from the desire to reach higher frequencies than those readily achieved by thinning bulk crystals, there have always been competing technologies or fundamental material or processing problems that have impeded the development. Finally, a point was reached in the wireless market wherein competing technologies appeared unable to meet the demands of modern wireless applications and thin film approaches began to receive some emphasis. This paper will survey the thin film resonator technology. Every effort will be made to provide an objective analysis of the technology in relation to applications and competing technologies, and point out obstacles and promises, as known, for further technology advancement to high frequencies.