Preparation, structure and ultraviolet photoluminescence of ZnO films by a novel chemical method

Preparation, structure and ultraviolet photoluminescence of ZnO films by a novel chemical method
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DOI:
10.1016/j.jssc.2004.07.030
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发表时间:
2004-10
影响因子:
3.3
通讯作者:
X. Gao;X. Li;W. Yu
X. Gao;X. Li;W. Yu
中科院分区:
化学3区
文献类型:
--
作者:
X. Gao;X. Li;W. Yu

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结合连续离子层吸附反应和化学浴沉积技术的优点,开发了一种新的、简单的化学沉积方法,用于在水溶液中沉积ZnO薄膜。该方法可在极短的时间内(约20min)制备出结晶度良好的致密连续ZnO薄膜。结果表明,在玻璃和Si(100)上沉积的ZnO薄膜呈现六方纤锌矿晶体结构,并沿(002)平面优先取向。该薄膜由200-300nm大小均匀的ZnO颗粒组成,具有致密和连续的外观。在391nm处有强而锐利的发射,在440-500nm波段有几个弱发射,表明所制备的薄膜具有良好的光学质量和化学计量性质。机理分析表明,热水反应时间和干燥过程是影响水溶液法制备膜的沉积过程和结晶行为的重要因素。
A novel and simple chemical method was developed for the deposition of ZnO films from aqueous solution, integrating the merits of successive ionic layer adsorption and reaction with the chemical bath deposition technology. By this new method, dense and continuous ZnO thin films with good crystallinity can be prepared in a very short time, e.g., in about 20min. Results show that as-deposited ZnO films on glass and Si (100) exhibit hexagonal wurtzite crystalline structure and the preferential orientation along (002) plane. With a dense and continuous appearance, the film is composed of ZnO particles in even size of 200–300nm. The strong and sharp emission at 391nm and several weak emissions at the wavelength band of 440–500nm indicate the high optical quality and the stoichiometrical nature of obtained film. Mechanism analysis shows that the reaction duration in hot water and the drying process are vital important factors affecting the deposition process and the crystallization behavior of the film prepared via the aqueous solution route.