Increased Photoelectrochemical Performance of Vanadium Oxide Thin Film by Helium Plasma Treatment with Auxiliary Molybdenum Deposition
Increased Photoelectrochemical Performance of Vanadium Oxide Thin Film by Helium Plasma Treatment with Auxiliary Molybdenum Deposition
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DOI：
10.1002/aesr.202200141
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发表时间：
2023-01
期刊：
影响因子：
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通讯作者：
S. Kajita;Tomoki Eda;Shuangyuan Feng;Hirohiko Tanaka;A. Bieberle‐Hütter;N. Ohno
中科院分区：
文献类型：
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作者：
S. Kajita;Tomoki Eda;Shuangyuan Feng;Hirohiko Tanaka;A. Bieberle‐Hütter;N. Ohno
氦 (He) 等离子体处理是一种在表面制造纳米结构并改变表面化学性质的通用工具。在此，将钒（V）薄膜暴露于氦等离子体中，并研究其形态和表面性质的变化。确定了可以改变表面形态的照射条件。在 He 等离子体照射期间，样品盖中的钼 (Mo) 沉积并形成 V2O5/MoO3 组合的复合纳米结构光电极。通过等离子体处理，光电化学（PEC）性能提高了三倍。除了表面积的增加之外，异质/复合结构、氧空位和还原氧化物（如 V6O13）的形成也降低了电荷转移电阻，有助于提高 PEC 性能。
Helium (He) plasma treatment can be a versatile tool to fabricate nanostructures on a surface and change the surface chemistry. Herein, vanadium (V) thin film is exposed to helium plasmas and the changes in morphology and surface properties are investigated. The irradiation condition at which the surface morphology can be changed is identified. During the He plasma irradiation, molybdenum (Mo) from the sample cover deposits and formation of composite nanostructured photoelectrode with a combination of V2O5/MoO3 occurs. The photoelectrochemical (PEC) performance increases threefold through the plasma treatment. In addition to the increase in the surface area, the formation of the heterogenous/composite structure, oxygen vacancies, and reduced oxides such as V6O13 decreases the charge‐transfer resistance and contributes to the improvement in the PEC performance.