Transition from smoothing to roughening of ion-eroded GaSb surfaces
Transition from smoothing to roughening of ion-eroded GaSb surfaces
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离子侵蚀 GaSb 表面从平滑到粗糙的转变
DOI：
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发表时间：
2009
期刊：
影响因子：
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通讯作者：
T. Metzger
中科院分区：
文献类型：
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作者：
A. Keller;A. Biermanns;G. Carbone;J. Grenzer;S. Facsko;O. Plantevin;R. Gago;T. Metzger
利用原位x射线反射率和掠入射小角散射观察到，在离子溅射过程中，GaSb（100）表面从初始平滑到粗化的瞬态行为伴随着自组织图案的形成。该诱导模式显示出六边形有序的纳米点阵列，其空间周期性为30 nm。图案的相关长度随着离子的影响而增加。在Bradley-Harper模型框架下[R]。M.布拉德利和J. M. E.哈珀。科学。抛光工艺。[A 6, 2390(1988)]，其中点状图案的形成是由溅射引起的表面粗糙和扩散引起的表面平滑的相互作用造成的，初始平滑行为可以用与图案形成相同的表面扩散过程来解释。
During ion sputtering of GaSb(100) surfaces a transient behavior from initial smoothing to roughening accompanied by self-organized pattern formation has been observed using in situ x-ray reflectivity and grazing incidence small angle scattering. The induced patterns show hexagonally ordered nanodot arrays with a spatial periodicity of 30 nm. The correlation length of the pattern increases with ion fluence. In the framework of the Bradley–Harper model [R. M. Bradley and J. M. E. Harper, J. Vac. Sci. Technol. A 6, 2390 (1988)], where the dot pattern formation results from an interplay of surface roughening due to sputtering and surface smoothing due to diffusion, the initial smoothing behavior is explained by the same surface diffusion processes as the pattern formation.