Collective-field-corrected strong field approximation for laser-irradiated metal clusters
Collective-field-corrected strong field approximation for laser-irradiated metal clusters
复制标题
激光照射金属团簇的集体场校正强场近似
DOI:
10.1088/0953-4075/47/12/124029
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发表时间:
2014
期刊:
影响因子:
--
通讯作者:
D. Bauer
中科院分区:
文献类型:
--
作者:
Th. Keil;D. Bauer
The strong field approximation (SFA) formulated in terms of so-called'quantum orbits' led to much insight into intense-laser driven ionization dynamics. In plain SFA, the emitted electron is treated as a free electron in the laser field alone. However, with improving experimental techniques and more advanced numerical simulations, it becomes more and more obvious that the plain SFA misses interesting effects even on a qualitative level. Examples are holographic side lobes, the low-energy structure, radial patterns in photoelectron spectra at low kinetic energies and strongly rotated angular distributions. For this reason, increasing efforts have been recently devoted to Coulomb corrections of the SFA. In the current paper, we follow a similar line but consider ionization of metal clusters. It is known that photoelectrons from clusters can be much more energetic than those emitted from atoms or small molecules, especially if the Mie resonance of the expanding cluster is evoked. We develop a SFA that takes the collective field inside the cluster via the simple rigid-sphere model into account. Our approach is based on field-corrected quantum orbits so that the acceleration process (or any other spectral feature of interest) can be investigated in detail.
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DOI:
10.1088/0953-4075/36/18/310
发表时间:
2003
期刊:
Journal of Physics B
影响因子:
--
作者:
S. Fomichev;S. Popruzhenko;D. Zaretsky;W. Becker
通讯作者:
W. Becker
影响因子:
2.9
作者:
P. Mulser;M. Kanapathipillai
通讯作者:
M. Kanapathipillai
影响因子:
8.6
作者:
G. Panasyuk;J. Schotland;Vadim A. Markel
通讯作者:
Vadim A. Markel
DOI:
10.1088/0953-4075/45/1/015601
发表时间:
2012
期刊:
Journal of Physics B: Atomic, Molecular and Optical Physics
影响因子:
--
作者:
M. S. Gravielle;D. Arbó;J. Miraglia;M. Ciappina
通讯作者:
M. Ciappina
影响因子:
56.9
作者:
Huismans, Y.;Rouzee, A.;Vrakking, M. J. J.
通讯作者:
Vrakking, M. J. J.