Laser-induced etching and deposition of W using a-SiO2 microspheres
Laser-induced etching and deposition of W using a-SiO2 microspheres
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DOI：
10.1007/s00339-002-1892-8
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发表时间：
2003-03-01
影响因子：
2.7
通讯作者：
B채uerle, D
中科院分区：
文献类型：
--
作者：
Denk, R;Piglmayer, K;B채uerle, D
A regular lattice of a-SiO2 microspheres on a quartz support is used as a microlens array for laser-induced surface patterning by etching and deposition of W in atmospheres of WF6 and WF6 + H-2, respectively.
