Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2.: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts
Interface effects for Cu, CuO, and Cu2O deposited on SiO2 and ZrO2.: XPS determination of the valence state of copper in Cu/SiO2 and Cu/ZrO2 catalysts
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DOI：
10.1021/jp014618m
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发表时间：
2002-07-11
影响因子：
3.3
通讯作者：
González-Elipe, AR
中科院分区：
文献类型：
--
作者：
Espinós, JP;Morales, J;González-Elipe, AR
通过铜的蒸发和随后的氧化处理，在平坦的SiO2和ZrO 2衬底的表面上沉积铜和铜的氧化物（Cu 2 O和CuO）。在Cu 2 P（3/2）结合能（BE）和俄歇参数（α '）的值中发现了几个eV的大的变化作为沉积的金属铜或铜氧化物的量的函数。变化的幅度还取决于进行实验的支持物的类型。这些变化已被归因于修改的因素，有助于该过程的初始和最终状态的影响，根据分散度和氧化铜部分和支持之间的相互作用的性质。所有这些变化都可以借助化学状态图系统化。用真实的催化剂进行的实验强调需要这样的图，其总结了用模型系统获得的结果，用于适当表征这种真实的材料中的负载氧化物相。
Copper and copper oxides (Cu2O and CuO) have been deposited by evaporation of copper and subsequent oxidizing treatments, on the surface of flat SiO2 and ZrO2 substrates. Large variations of several eVs have been found in the values of the Cu 2P(3/2) binding energy (BE) and Auger parameter (alpha') of copper as a function of the amount of deposited metallic copper or copper oxides. The magnitude of the changes was also dependent on the type of support upon which the experiment was carried out. These changes have been attributed to modifications in the factors contributing to the initial and final state effects of the process, according to the dispersion degree and the nature of the interactions between the copper oxide moieties and the support. All of these changes can be systematized with the help of chemical state plots. Experiments carried out with real catalysts stress the need of such plots, which summarize the results obtained with the model systems, for a proper characterization of the supported oxide phases in this kind of real materials.