Buckle delamination on patterned substrates
Buckle delamination on patterned substrates
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DOI：
10.1016/j.actamat.2004.03.014
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发表时间：
2004-06-07
期刊：
影响因子：
9.4
通讯作者：
Hutchinson, JW
中科院分区：
文献类型：
--
作者：
Moon, MW;Lee, KR;Hutchinson, JW
在膜沉积之前应用于基板的光刻技术可以产生被高粘附性区域包围的低界面粘附性区域。如果膜处于压缩下并且如果屈曲分层成核，则可以控制条件使得分层被限制在低粘附力的图案化区域。当低粘附性区域是条带时，条带的宽度控制弯曲形态：窄条带的光滑欧拉弯曲，较宽条带的不对称电话线弯曲，以及在非常有限的条件范围内的对称静脉曲张弯曲。在屈曲状态下的弹性能的结果表明，在临界应力以上的电话线的形态是优选的形态。能量释放率的传播脱层确定的三种形态。锥形条提供了一种精确的测量界面附着力的方法，其基于层离停止的条的宽度。(C)2004 Acta Materialia Inc.由爱思唯尔有限公司出版。保留所有权利。
Lithographic techniques applied to a substrate prior to film deposition can create areas of low interface adhesion surrounded by regions of high adhesion. If the film is under compression and if buckle delamination is nucleated, conditions can be controlled such that delaminations are confined to the patterned areas of low adhesion. When the area of low adhesion is a strip, the width of the strip controls the buckle morphology: smooth Euler buckles for narrow strips, asymmetric telephone cord buckles for wider strips, and symmetric varicose buckles under a very limited range of conditions. Results for the elastic energy in the buckled state show that above a critical stress the telephone cord morphology is the preferred morphology. Energy release rates for propagating delaminations are determined for each of the three morphologies. Tapered strips provide an accurate means of measuring interface adhesion based on the width of the strip where the delamination arrests. (C) 2004 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.