Observation of atomic diffusion at twin-modified grain boundaries in copper
Observation of atomic diffusion at twin-modified grain boundaries in copper
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DOI:
10.1126/science.1160777
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发表时间:
2008-08-22
期刊:
影响因子:
56.9
通讯作者:
Tu, K. N.
中科院分区:
文献类型:
--
作者:
Chen, Kuan-Chia;Wu, Wen-Wei;Tu, K. N.
Grain boundaries affect the migration of atoms and electrons in polycrystalline solids, thus influencing many of the mechanical and electrical properties. By introducing nanometer- scale twin defects into copper grains, we show that we can change the grain- boundary structure and atomic- diffusion behavior along the boundary. Using in situ ultrahigh- vacuum and high- resolution transmission electron microscopy, we observed electromigration- induced atomic diffusion in the twin- modified grain boundaries. The triple point where a twin boundary meets a grain boundary was found to slow down grain- boundary and surface electromigration by one order of magnitude. We propose that this occurs because of the incubation time of nucleation of a new step at the triple points. The long incubation time slows down the overall rate of atomic transport.