Coexistence of fast photodarkening and slow photobleaching in Ge19As21Se60 thin films
Coexistence of fast photodarkening and slow photobleaching in Ge19As21Se60 thin films
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DOI:
10.1364/oe.20.012416
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发表时间:
2012-05-21
期刊:
影响因子:
3.8
通讯作者:
Adarsh, K. V.
中科院分区:
文献类型:
--
作者:
Khan, Pritam;Barik, A. R.;Adarsh, K. V.
We experimentally demonstrate the coexistence of two opposite photo-effects, viz. fast photodarkening (PD) and slow photobleaching (PB) in Ge19As21Se60 thin films, when illuminated with a laser of wavelength 671 nm. PD appears to begin instantaneously upon light illumination and saturates in tens of seconds. By comparison, PB is a slower process that starts only after PD has saturated. Both PD and PB follow stretched exponetial dependence on time. Modeling of overall change as a linear sum of two contributions suggests that the changes in As and Ge parts of glass network respond to light effectively indepndent of each other. (C) 2012 Optical Society of America