Study of epitaxial films of Ag, Pd and AgPd deposited by dc sputtering
Study of epitaxial films of Ag, Pd and AgPd deposited by dc sputtering
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直流溅射沉积Ag、Pd和AgPd外延薄膜的研究
DOI：
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发表时间：
1990
期刊：
影响因子：
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通讯作者：
F. Bouillon
中科院分区：
文献类型：
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作者：
F. Reniers;Paule Kons;P. Delcambe;L. Binst;M. Jardinier;F. Bouillon
本文叙述了用辉光放电溅射法在MgO（100）面上沉积银、钯和银钯合金外延膜的实验条件。对于最后两个系统，观察到取向（100）d//（100）s（其中d表示存款，s表示衬底）。用THEED、RHEED、SAD、TEM和AES等手段对薄膜进行了表征。用ICP测定了合金的体相组成。对凝聚膜的表面纯度进行了测试和讨论。
The experimental conditions to condense epitaxial films of silver, palladium and silverpalladium alloys onto (100) air-cleaved MgO faces by glow discharge sputtering are related. The orientation (100)d//(100)s (where d indicates deposit and s substrate) is observed for the two last systems. The films are characterized by THEED, RHEED, SAD, TEM and AES. The bulk composition of the alloys is determined by ICP. The surface purity of the condensed films is examined and discussed.