Modulation Effects of Photocarriers on the Terahertz Plasma-Wave Resonance in High-Electron-Mobility Transistors under Interband Photoexcitation
Modulation Effects of Photocarriers on the Terahertz Plasma-Wave Resonance in High-Electron-Mobility Transistors under Interband Photoexcitation
复制标题
带间光激发下光载流子对高电子迁移率晶体管太赫兹等离子体波谐振的调制效应
DOI:
10.1143/jjap.44.3842
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发表时间:
2005
影响因子:
1.5
通讯作者:
V. Ryzhii
中科院分区:
文献类型:
--
作者:
M. Hanabe;T. Otsuji;T. Ishibashi;T. Uno;V. Ryzhii
Two-dimensional (2-D) electron plasma in a submicron channel of a high-electron mobility transistor (HEMT) is excited by interband photoexcitation, resulting in performing the photomixing function. The injected photoelectrons modulate the total 2-D electron density, affecting the plasma resonant properties. The modulation depth of the density of 2-D electrons by the photoelectrons deeply relates to the resonant intensity and fr. This effect was modeled analytically in the 2-D plasma hydrodynamic equation. In order to validate the analytical calculation, the plasma-wave resonance was experimentally observed for a 0.15-µm gate-length InGaP/InGaAs/GaAs pseudomorphic HEMT in the terahertz range. At the modulation depth of 30%, the resonance was clearly observed with a double peak (the peak at 1.9/5.8 THz corresponding to the fundamental/third harmonic resonance). The resonant frequencies slightly shifted downward and the intensity attenuated with decreasing the modulation depth. Observed resonant frequencies support the analytical calculation.