Bromine Vacancy Redistribution and Metallic-Ion-Migration-Induced Air-Stable Resistive Switching Behavior in All-Inorganic Perovskite CsPbBr3 Film-Based Memory Device
Bromine Vacancy Redistribution and Metallic-Ion-Migration-Induced Air-Stable Resistive Switching Behavior in All-Inorganic Perovskite CsPbBr3 Film-Based Memory Device
复制标题
全无机钙钛矿 CsPbBr3 薄膜存储器件中溴空位重新分布和金属离子迁移引起的空气稳定电阻开关行为
DOI:
10.1002/aelm.201900754
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发表时间:
2020
影响因子:
6.2
通讯作者:
Ma Hongxiang
中科院分区:
文献类型:
--
作者:
Zhu Yuanyuan;Cheng Pengwei;Shi Jing;Wang Hongjun;Liu Yong;Xiong Rui;Ma Hongyu;Ma Hongxiang
All‐inorganic halide perovskites have attracted a great deal of attention for applications in resistive switching (RS) memory devices due to their superior stability compared to organic–inorganic hybrid halide perovskites. RS memory devices utilizing air‐stable all‐inorganic halide perovskite cesium lead bromide (CsPbBr3) film as the switching layer, which are successfully prepared by spin coating at low temperature, are demonstrated. Memory devices based on CsPbBr3film exhibit typical reproducible bipolar RS behavior and superior switching characteristics, including the high ON/OFF ratio (≈104), long data retention (>5 × 104s), and environmental stability. In addition, multilevel storage capability can be achieved through controlling the different compliance currents. The formation and rupture of bromine (Br) vacancy conducting filaments (CFs) is proposed to explain the switching behavior in the Pt‐anode‐based memory devices, which is verified by XPS depth‐profiling analysis. Moreover, the coexistence of Br vacancies and Ag metallic CFs is suggested to be responsible for the switching behavior in Ag‐anode based device. These results demonstrate that the all‐inorganic halide perovskite CsPbBr3film will be the promising switching material for nonvolatile memory devices.