Improvement in Sputtering Rate Uniformity over Large Deposition Area of Large-Scale Ion Beam Sputtering System

Improvement in Sputtering Rate Uniformity over Large Deposition Area of Large-Scale Ion Beam Sputtering System
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大型离子束溅射系统大沉积区域溅射速率均匀性的改善

DOI:
10.7566/jpscp.33.011092
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发表时间:
2021
期刊:
JPS Conf. Proc.
影响因子:
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通讯作者:
Soyama Kazuhiko
Soyama Kazuhiko
中科院分区:
--
文献类型:
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作者:
Maruyama Ryuji;Yamazaki Dai;Akutsu-Suyama Kazuhiro;Hanashima Takayasu;Miyata Noboru;Aoki Hiroyuki;Soyama Kazuhiko

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