Green laser diodes with low threshold current density via interface engineering of InGaN/GaN quantum well active region
Green laser diodes with low threshold current density via interface engineering of InGaN/GaN quantum well active region
复制标题
通过 InGaN/GaN 量子阱有源区的界面工程实现低阈值电流密度的绿色激光二极管
DOI:
10.1364/oe.25.000415
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发表时间:
2017-01-09
期刊:
影响因子:
3.8
通讯作者:
Yang, Hui
中科院分区:
文献类型:
--
作者:
Tian, Aiqin;Liu, Jianping;Yang, Hui
By observing the morphology evolution of green InGaN/GaN quantum well (QW) and studying the catholuminescence (CL) property, we investigate indium-segregation-related defects that are formed at green InGaN/GaN QW interfaces. Meanwhile, we also propose the approach and suggest the mechanism to remove them for green InGaN/GaN QW grown on both GaN templates and free-standing GaN substrates. By engineering the interface of green InGaN/GaN QWs, we have achieved green laser diode (LD) structure with low threshold current density of 1.85 kA cm(-2). The output power of the green LD is 58 mW at a current density of 6 kA cm(-2) under continuous-wave operation at room temperature. (C) 2017 Optical Society of America