Low-temperature thermal expansion of spinel
Low-temperature thermal expansion of spinel
复制标题
尖晶石的低温热膨胀
DOI：
10.1088/0953-8984/4/30/004
复制
发表时间：
1992
期刊：
影响因子：
--
通讯作者：
E. A. Al
中科院分区：
文献类型：
--
作者：
N. W. Grimes;E. A. Al
在77-300K温度范围内测定了合成尖晶石镁铝尖晶石的晶格参数，其结果可表示为a=8.0739+3.565*10-8T2+9.90*10-11T3，其中a是TK时以AA表示的晶格参数，与以前报道的室温以上温度范围的测量结果一致。导出了相应的线性热膨胀系数的变化。这表明尖晶石的热膨胀只比硅和用作外延衬底的III-V半导体的热膨胀略大。
The lattice parameter of synthetic spinel, MgAl2O4 has been determined over the temperature range 77-300 K. The results can be expressed in the form a=8.0739+3.565*10-8 T2+9.90*10-11 T3 where a is the lattice parameter in AA at T K, and are consistent with measurements previously reported for ranges of temperature above room temperature. The corresponding variation for the linear coefficient of thermal expansion is derived. This shows that spinel has a thermal expansion only slightly greater than that of silicon and of the III-V semiconductors for which materials it has been used as an epitaxial substrate.