Residue analysis of thermally depolymerized phthalaldehyde‐based polymer thin films
Residue analysis of thermally depolymerized phthalaldehyde‐based polymer thin films
复制标题
热解聚邻苯二甲醛基聚合物薄膜的残留物分析
DOI：
10.1002/pat.5244
复制
发表时间：
2021
影响因子：
3.4
通讯作者：
Kohl, Paul A.
中科院分区：
文献类型：
--
作者：
Engler, Anthony;Lo, Chi Kin;Kohl, Paul A.
在这项研究中，聚（邻苯二甲醛），pPHA，的therapeutic进行了调查，和非挥发性的残留物产生的特点是通过本体和表面分析，以提供洞察其使用作为热扫描探针光刻的抗蚀剂材料。需要300°C的温度持续短时间以除去几乎所有由pPHA解聚产生的残余物。使用X射线光电子能谱（XPS）来定量热处理后的痕量烃残留物。飞行时间二次离子质谱（西姆斯）结果表明，残留物主要是PHA单体和低聚物，但也包括烃类炭。作为共聚物组成的函数的残留物的分子量和组成的差异进行了研究，以提供设计新的热抗蚀剂材料的洞察力。
In this study, thermolysis of poly(phthalaldehyde), pPHA, was investigated, and the nonvolatile residues produced were characterized by bulk and surface analyses to provide insight into its use as a resist material for thermal scanning probe lithography. A temperature of 300°C for a short time was required to remove nearly all of the residue produced from pPHA depolymerization. X‐ray photoelectron spectroscopy (XPS) was used to quantify the trace amount of hydrocarbon residue after thermolysis. Time‐of‐flight secondary ion mass spectrometry (SIMS) results show that the residue is largely PHA monomers and oligomers, but also include hydrocarbon char. Differences in molecular weight and composition of the residue as a function of copolymer composition were investigated to give insight into designing new thermal resist materials.