Tunable Double Epsilon-Near-Zero Behavior in Niobium Oxynitride Thin Films
Tunable Double Epsilon-Near-Zero Behavior in Niobium Oxynitride Thin Films
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DOI：
10.1016/j.apsusc.2021.150912
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发表时间：
2021-08
影响因子：
6.7
通讯作者：
Ryan Bower;M. P. Wells;F. Johnson;Rebecca Kilmurray;B. Doiron;E. Calì;G. Mallia;B. Zou;A. Mihai;N. Harrison;S. Fearn;R. Oulton;N. Alford;L. Cohen;P. Petrov
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文献类型：
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作者：
Ryan Bower;M. P. Wells;F. Johnson;Rebecca Kilmurray;B. Doiron;E. Calì;G. Mallia;B. Zou;A. Mihai;N. Harrison;S. Fearn;R. Oulton;N. Alford;L. Cohen;P. Petrov
难熔过渡金属氮化物和氮氧化物由于其较高的热稳定性、可调谐性和相对较低的损耗而在等离子体应用中受到关注。这里介绍的是反应溅射铌氮氧化物薄膜的实验研究，展示了屏蔽等离子体波长在 ~90 nm 光谱范围内可调。光学响应与电阻率和霍尔测量相关。此外，还对观察到的双 epsilon 近零 (2ENZ) 行为进行了解释，并将其与其他材料系统进行了比较。薄膜成分和结构的实验分析与基于密度泛函理论的计算模型相结合，解释了观察到的色散行为，并表明 2ENZ 行为是由于沉积过程中氧气在薄膜中的结合而产生的。
Refractory transition metal nitrides and oxynitrides are of interest for plasmonic applications due to their increased thermal stability, tunability and comparatively low loss. Presented here is an experimental investigation of reactively sputtered niobium oxynitride thin films, demonstrating screened plasma wavelengths tunable over a ~90 nm spectral range. The optical response is correlated with resistivity and Hall measurements. Additionally, an explanation is provided for the double epsilon-near-zero (2ENZ) behavior observed and it is compared with other material systems. Experimental analysis of film composition and structure are combined with computational modelling, based on density functional theory, to explain the dispersion behavior observed and indicate that 2ENZ behavior arises due to the incorporation of oxygen within the films during deposition.