Molecular Emission Spectrometric Detection of Low Level Sulfur Using Hollow Cathode Glow Discharge
Molecular Emission Spectrometric Detection of Low Level Sulfur Using Hollow Cathode Glow Discharge
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使用空心阴极辉光放电的分子发射光谱检测低含量硫
DOI：
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
W. Lee
中科院分区：
文献类型：
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作者：
I. Koo;W. Lee
建立了一种高灵敏度的H2S/Ar等离子体中十亿分之一硫的测定方法。该方法是基于在空心阴极辉光放电中分别用射频（RF）或60Hz交流电源激发Ar/H2S或Ar/H2S/O2混合气体，并分别测量电子激发的S2 * 或SO2 * 物种的发射谱线强度。激发所需的RF或AC功率在维持在几毫巴的气压下不超过30 W。从SO2 * 物种的发射强度表现出良好的线性响应的硫浓度范围从5 ppbv，这对应于S/N = 5，到500 ppbv。但只有在低流速（20sccm（mL/min））下，S2 * 的强度才与H2S的浓度呈线性关系。使用SO2气体作为硫源的单独实验表明，在氩等离子体中的O2的存在下是必不可少的获得突出的SO2 * 发射线。
A highly sensitive detecting method has been developed for determining part per billion of sulfur in H 2 S/Ar plasma. The method is based on the excitation of Ar/H 2 S or Ar/H 2 S/O 2 mixture in hollow cathode glow dischargesustained by radiofrequency (RF) or 60 Hz AC power and the spectroscopic measurement of the intensity of emission lines from electronically excited S 2 * or SO 2 * species, respectively. The RF or AC power needed for the excitation did not exceed 30 W at a gas pressure maintained at several mbar. The emission intensity from the SO 2 * species showed excellent linear response to the sulfur concentration ranging from 5 ppbv, which correspond to S/N = 5, to 500 ppbv. But the intensity from the S 2 * species showed a linear response to the H 2 S only at low flow rate under 20 sccm (mL/min) of the sample gas. Separate experiments using SO 2 gas as the source of sulfur demonstrated that the presence of O 2 in the argon plasma is essential for obtaining prominent SO 2 * emission lines.