Tuning the termination of the SrTiO3(110) surface by Ar+ sputtering
Tuning the termination of the SrTiO3(110) surface by Ar+ sputtering
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DOI：
10.1063/1.3180701
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发表时间：
2009-07
影响因子：
4
通讯作者：
Zhiming Wang;Kehui Wu;Q. Guo;Jiandong Guo
中科院分区：
文献类型：
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作者：
Zhiming Wang;Kehui Wu;Q. Guo;Jiandong Guo
我们报告了扫描隧道显微镜研究的SrTiO 3（110）表面处理Ar+溅射，然后退火。两种类型的终端共存的表面上，这是空间上确定为4×1重构SrTiO层和O层覆盖的富钛氧化物团簇，分别。两种类型的相对面积比通过溅射剂量可重复地调节，并且获得具有SrTiO或O终止的单相表面。该表面在高达1100 °C的温度和6×10−5 mbar至超高真空的氧分压下稳定，为我们提供了灵活的外延生长模板。
We report a scanning tunneling microscopy study on the SrTiO3(110) surface treated with Ar+ sputtering followed by annealing. Two types of termination coexist on the surface, which are spatially identified as the 4×1 reconstructed SrTiO layer and the O layer covered by Ti-rich oxide clusters, respectively. The relative areal ratio of the two types is tuned by sputtering dose reproducibly, and monophased surface with either SrTiO or O termination is obtained. The surface is stable at temperatures up to 1100 °C and under oxygen partial pressures from 6×10−5 mbar to ultra high vacuum, providing us a flexible epitaxial growth template.