Constructing robust and functional micropatterns on polystyrene surfaces by using deep UV irradiation.
Constructing robust and functional micropatterns on polystyrene surfaces by using deep UV irradiation.
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DOI：
10.1021/la304931x
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发表时间：
2013-02
期刊：
影响因子：
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通讯作者：
M. Palacios;O. García;J. Rodríguez-Hernández
中科院分区：
文献类型：
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作者：
M. Palacios;O. García;J. Rodríguez-Hernández
我们报告了不同的表面图案的制备的基础上的光交联/降解动力学的聚苯乙烯（PS），通过使用紫外光。在暴露于UV光时，PS可以最初交联，而过量的暴露时间或强度引起材料的降解。通常，光刻法采用正性或负性光致抗蚀剂层，其在去除曝光或未曝光区域时转移掩模的图案。在此，我们提出了一个系统，可以是负的和正的，这取决于几个方面，包括照射时间，强度，或存在的吸收活性物质（光引发剂）使用一般设置。由于曝光时间的优化和使用适当的覆盖物或掺入适量的光引发剂（在该特定情况下为IRG 651），可以获得不同的定制表面图案。此外，使用例如嵌段共聚物改变聚苯乙烯的化学组成可导致具有可变官能团的表面图案。在这项研究中，我们描述了使用聚苯乙烯-嵌段-聚（2，3，4，5，6-五氟苯乙烯）嵌段共聚物的表面图案的形成。引入氟化部分清楚地修改的膜的润湿性相比，用PS获得的相同的结构。因此，我们在此提出了一种图案化方法，该方法不仅可以同时改变形态，还可以改变表面化学组成。
We report the preparation of different surface patterns based on the photo-cross-linking/degradation kinetics of polystyrene (PS) by using UV light. Upon exposure to UV light, PS can be initially cross-linked, whereas an excess of the exposure time or intensity provokes the degradation of the material. Typically photolithography employs either positive or negative photoresist layers that upon removal of either the exposed or the nonexposed areas transfer the pattern of the mask. Herein, we present a system that can be both negative and positive depending on several aspects, including the irradiation time, intensity, or presence of absorbing active species (photoinitiators) using a general setup. As a result of the optimization of the time of exposure and the use of an appropriate cover or the incorporation of an appropriate amount of photoinitiator (in this particular case IRG 651), different tailor-made surface patterns can be obtained. Moreover, changes of the chemical composition of the polystyrene using, for instance, block copolymers can lead to surface patterns with variable functional groups. In this study we describe the formation of surface patterns using polystyrene-block-poly(2,3,4,5,6-pentafluorostyrene) block copolymers. The introduction of fluorinated moieties clearly modifies the wettability of the films when compared with that of the same structures obtained with PS. As a consequence we present herein a patterning methodology that can simultaneously vary not only the morphology but also the surface chemical composition.