Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings
Hybrid polymers processed by substrate conformal imprint lithography for the fabrication of planar Bragg gratings
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DOI：
10.1007/s00339-016-9767-6
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发表时间：
2016-03-01
影响因子：
2.7
通讯作者：
Klein, J. J.
中科院分区：
文献类型：
--
作者：
Foerthner, M.;Rumler, M.;Klein, J. J.
在这项工作中，我们提出了一种方法，使用紫外增强衬底保形压印光刻（UV-SCIL）作为软压印技术结合准分子激光照射，在全晶圆级的平面波导内制造布拉格光栅。第一次，不同的混合聚合物（OrmoComp（R），OrmoStamp，OrmoCore，OrmoClad和OrmoClear）可以使用UV-SCIL成功地图案化。对于OrmoComp（R）（显示与OrmoStamp和OrmoClad非常相似的结果），可以实现完整的压印过程。在压印过程中，OrmoCore在氧气存在下形成抑制层，这也可以在使用OrmoClear时观察到。详细阐述了加工选项以显着降低抑制效应，其中后者主要是由于UV-SCIL工作印章的大气含氧PDMS层造成的。进一步地，通过使用相位掩模和UV受激准分子激光器调谐OrmoComp（R）的折射率（RI），证明了在电信波长处工作的平面布拉格光栅的成功实现。FTIR测量结果表明，RI的变化可以清楚地与混合聚合物的化学组成的变化，在激光曝光。
In this work, we present an approach to use UV-enhanced substrate conformal imprint lithography (UV-SCIL) as a soft imprint technique combined with excimer laser irradiation to manufacture Bragg gratings within planar waveguides on a full-wafer scale. For the first time, different hybrid polymers (OrmoComp (R), OrmoStamp, OrmoCore, OrmoClad and OrmoClear) could be successfully patterned using UV-SCIL. For OrmoComp (R) (showing results very similar to OrmoStamp and OrmoClad), a complete imprint process could be realized. OrmoCore formed an inhibition layer in the presence of oxygen during the imprint, as could be observed for the use of OrmoClear as well. Processing options were elaborated to reduce the inhibition effect significantly, whereby the latter is mainly due to the atmospheric oxygen-containing PDMS layer of the UV-SCIL working stamp. Further on, the successful realization of a planar Bragg grating operating at the telecom wavelength is demonstrated by tuning the refractive index (RI) of OrmoComp (R) using a phase mask and an UV excimer laser. FTIR measurements show that the change in RI can be clearly correlated with a change in the chemical composition of the hybrid polymer during laser exposure.