An instrument for 3D x-ray nano-imaging
An instrument for 3D x-ray nano-imaging
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DOI：
10.1063/1.4737624
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发表时间：
2012-07-01
影响因子：
1.6
通讯作者：
Bunk, O.
中科院分区：
文献类型：
--
作者：
Holler, M.;Raabe, J.;Bunk, O.
我们提出了一种专用于3D扫描x射线显微镜的仪器，允许样品通过光束精确扫描，同时可以改变x射线入射角度。样品的位置是通过激光干涉测量法根据光束定义光学来控制的。仪器的位置稳定性优于10 nm标准偏差。使用扫描x射线衍射显微镜对仪器性能进行了评估，我们展示了光刻测试图案的二维成像分辨率为18 nm，而光束由直径为3 μ m的针孔定义。在微处理器铜互连测试对象的三维上，实现了53 nm的分辨率。(C) 2012年美国物理研究所。[http://dx.doi.org/10.1063/1.4737624]
We present an instrument dedicated to 3D scanning x-ray microscopy, allowing a sample to be precisely scanned through a beam while the angle of x-ray incidence can be changed. The position of the sample is controlled with respect to the beam-defining optics by laser interferometry. The instrument achieves a position stability better than 10 nm standard deviation. The instrument performance is assessed using scanning x-ray diffraction microscopy and we demonstrate a resolution of 18 nm in 2D imaging of a lithographic test pattern while the beam was defined by a pinhole of 3 mu m in diameter. In 3D on a test object of copper interconnects of a microprocessor, a resolution of 53 nm is achieved. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4737624]